ECR plasma deposition device "AFTEX-6000 series"
Multi-material multilayer films can be formed! A film deposition device capable of high-quality, high-crystallinity thin film formation.
The "AFTEX-6000 series" forms high-quality thin films at low temperatures and with low damage by directly reacting low-pressure, high-density ECR plasma flows with sputtered particles. Equipped with two ECR plasma sources, it enables fully automated transport and film formation, making it ideal for multilayer film formation. 【Features】 ■ Multilayer film formation with a wide range of film types ■ High refractive index control ■ High-speed film formation ■ High quality and high crystallinity at low temperatures and low damage ■ Cleaning effect on substrates and growth surfaces *For more details, please refer to the catalog or feel free to contact us.
- 企業：JSWアフティ
- 価格：Other
